Dynamic Fluoride Ion Cleaning Goes Deep - Aerospace
https://www.aerospacemanufacturinganddesign.com/article/amd0512-oxides-removal-process/
May 11, 2012 · The DFIC process, also known as Hydrogen Fluoride (HF) Ion Cleaning, results from the reaction of fluorine with various oxides. HF gas can be toxic if it escapes into the atmosphere. However, improvements in gas monitoring sensors and digital electronics, resulting from its widespread use in the semiconductor industry, have made it safe and reliable for parts …
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